Deepsmartech | Research-Grade iCVD Equipment

Research iCVD

Research iCVD systems are designed to provide precise, uniform coatings at the nanoscale, making them ideal for advanced material studies. With flexible process control and reliable reproducibility, they enable researchers to explore new applications, optimize coating parameters, and validate performance in laboratory environments.

Research iCVD (D4L-iH2)

Coating Speed: 1–100 nm/min (varies depending on substrate material)

Coating Speed:

1–100 nm/min

(varies depending on substrate material)

Coating Speed:

1–100 nm/min

(varies depending on substrate material)

Coating Uniformity: Thickness variation within 10% across effective area

Coating Uniformity:

Thickness variation within 10% across effective area

Coating Uniformity:

Thickness variation within 10% across effective area

Coating Area: 200 mm × 200 mm

Coating Area:

200 mm × 200 mm

Coating Area:

200 mm × 200 mm

Chamber Pressure: 50–500 mTorr (total pressure during process)

Chamber Pressure:

50–500 mTorr (total pressure during process)

Chamber Pressure:

50–500 mTorr (total pressure during process)

Cooling Stage Temperature: 10–50 °C

Cooling Stage Temperature:

10–50 °C

Cooling Stage Temperature:

10–50 °C

Filament Temperature: 150–300 °C

Filament Temperature:

150–300 °C

Filament Temperature:

150–300 °C

Canister Temperature (Source): RT–100 °C

Canister Temperature (Source):

RT–100 °C

Canister Temperature (Source):

RT–100 °C

Supply Line Temperature: RT–150 °C

Supply Line Temperature:

RT–150 °C

Supply Line Temperature:

RT–150 °C

Chamber Temperature: RT–150 °C

Chamber Temperature:

RT–150 °C

Chamber Temperature:

RT–150 °C

Canister Configuration: 4 ea (capacity: 30 ml each), automatic open/close, supports up to 3 copolymers

Canister Configuration:

4 ea (capacity: 30 ml each), automatic open/close, supports up to 3 copolymers

Canister Configuration:

4 ea (capacity: 30 ml each), automatic open/close, supports up to 3 copolymers

D4L-iH2 iCVD Coating, redefining research-grade coating technology

D4L-iH2 iCVD Coating,

redefining research-grade coating technology

D4L-iH2 iCVD Coating, redefining research-grade coating technology

The D4L-iH2 is Deepsmartech’s advanced iCVD (initiated Chemical Vapor Deposition) research equipment, designed to set a new standard in thin-film coating technology. Unlike conventional CVD systems, it delivers cost efficiency, process scalability, and exceptional precision in a compact, user-friendly design.

Supporting applications from semiconductors and batteries to hydrogen fuel cells and solar cells, the D4L-iH2 provides stability, safety, and reproducibility for cross-disciplinary research. Its automated chamber and precise dosing system ensure reliable operation at every step.

With the ability to fine-tune key iCVD parameters such as coating speed, uniformity, temperature, and pressure, the system accelerates R&D cycles and adapts to evolving material needs, offering long-term value in next-generation coating research.